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Mr. Stephen D. Hsu
Director SMO\RET product engineering Computational Litho Products ASML |
| Education: | |
| • MS Materials Science and Engineering University of Utah |
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| Experiences: | |
| • Director, SMO\RET product engineering group, ASML Brion • Sr. Application development manager, ASML MaskTools • Sr. Staff Application Engineer, KLA-Tencor Corporation • Staff Engineer, National Semiconductor Corp., FRC, Advanced Technology Group |
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| Biography: | |
| Stephen D. Hsu is currently the director of SMO\RET product engineering at ASML Brion. He has been working on all aspects of advanced microlithography development for over 25 years including: overlay/alignment optimization/control implementation for HVM, stepper/scanner characterization, reticle inspection, and OPC\RET product development. In the past 15 years, he has been developing resolution enhancement technique (RET) solutions covering: sub-resolution assist features (SRAF), chromeless phase lithography (CPL), double dipole lithography (DDL), Optical Proximity Correction (OPC), and Source mask optimization (SMO). He has worked with customers worldwide to implement these RETs and has produced functional device in foundries and IDM as practical low k1 lithography solutions. Presently he is focusing on sub-10nm patterning technology development, using source mask optimization for ArF multiple patterning and EUV lithography. Stephen has been regularly invited by SPIE to teach the “Principles and Practical Implementation of Multiple Patterning” short course. He has authored 85 papers and holds 39 patents related to advanced lithography and resolution enhancement techniques. |
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