


	Dr. Mark L. O’Neill Global Technology Director Air Products

Education:
• Ph.D. in Physical Chemistry fom Carleton University in Ottawa, Canada.

Biography:
Mark O’Neill holds a Ph.D. in Physical Chemistry fom Carleton University in Ottawa, Canada. He was also an NSERC postdoctoral fellow in the Department of Chemical and Petroleum Engineering at the University of Texas at Austin, and in the Department of Chemical and Petroleum Engineering at the University of Pittsburgh. He joined the Materials Research Center of Air Products and Chemicals, Inc. in August of 1997 where he began research on low dielectric constant materials for IC manufacturing. Until January 2014 Mark was the Global Technology Director for Air Products’ market leading Organosilane Precursors Division and was a key inventor of Air Products patented PDEMS® Low Dielectric constant precursors and the team lead for the industry leading silicon oxide low temperature atomic layer deposition product AP-LTO® 520 for advanced patterning and FEOL dielectrics. Mark is currently located in Tempe, AZ as the Global Technology director for Air Products’ Planarization Division developing high performance slurries and cleans for metal interconnects, metal and dielectric barrier, STI/oxide, and tungsten applications. Dr. O’Neill currently has more than thirty patents, has published and presented more than fifty papers, and has given multiple invited talks at international symposia focused on new materials for IC manufacturing.