Topic:
A computer science perspective on computational challenges for sub-10nm mask synthesis
Abstract:
Mask synthesis algorithms for the sub-10nm nodes are an interesting intellectual challenge for the computer scientist. The challenges range from full-layer operations such as multi-patterning decomposition to the very localized such as hot-spot fixing, from 3D reasoning about mask and wafer topography to math intensive transforms needed in inverse lithography techniques. Layered on these computational challenges are the complexity of dealing with multi gigabyte databases while accounting for new advances in multi-core and multi-thread processing, and novel cache, memory, and storage architectures. This talk will enumerate the challenges, discuss how these have changed over time, and describe how deep familiarity with other computationally challenging EDA topics such as simulation and place and route will help in the faster development of practical mask synthesis solutions for foundry, logic and memory applications.