The first 0.33-NA NXE:3300B system has shown imaging, overlay and defectivity performance in line with insertion at the targeted customer nodes. System extensions are planned to further tighten its specifications, to be standard in its successor, the NXE:3350B, of which the first will be shipped in 2015.
For WPD, good source performance is essential, and key items include: (1) power (2) availability (3) dose control.
In cooperation with suppliers and users, ASML is taking the lead in making available a fully integrated EUV pellicle solution including: (1) pellicle films and a supply chain therefor, (2) pellicle frames, (3) pellicle mounting, dismounting and remounting tools (3) reticle pods compatible with pellicle, (4) scanners being compatible with pelliclized reticle usage. We will present an update on the status of EUV pellicle industrialization.