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Douglas Yu / 余振華博士

Senior Director

Integrated Interconnect and

Packaging Technology, TSMC R&D
   
Education:  
• Ph.D. Materials Engineering, Georgia Institute of Technology
   
Experiences:  
• Senior Director, Advanced Module Technology Div., R&D
Director, Advanced Shrink Technology, TSMC R&D
Semiconductor Technology R&D, AT&T Bell Labs
   
Biography:  
Head of TSMC Advanced Backend R&D.
Innovate, develop and deliver TSMC WLSI Technologies  for wide range of device- and system-integrations.
Pioneer and deliver Industry’s 1st 3D-IC to production using innovative CoWoSTM for homogeneous and heterogeneous system-integrations from 28nm node.
Deliver Industry’s 1st Cu/Low-K technologies to production from 0.13mm node on with the best performance and power.  Set industry high standard of on-chip interconnections.
Pioneer and deliver Foundry’s 1st Cu/FSG to production.  Develop leadership multilayer high-density Al/USG & FSG.
Published numerous technical papers and 2 book chapters.
Granted more than 450 issued US Patents.

Dr. Yu’s outstanding R&D accomplishments have won many recognitions, including:
─ 2013 National Industry Innovation and Navigation Award, MOEA
2012 IEEE Fellow
3 times TSMC Chairman (Dr. Morris Chang) Award winner.
2009 Best Engineer Award, CIE.
2006 National R&D Manager Excellence Award, CPMA.
2006 TSMC Innovation and Customer Partnership Awards
2004 Industrial Technology Advancement Award, MOEA
2003 Outstanding Science and Technology Award, National Science Council, The Executive Yuan, Taiwan
2001 National Invention Award, MOEA